[1] 刘璇,张电,刘一军,等.AlN陶瓷注凝成型体系研究进展[J].耐火材料,2020,54(1):82-87. [2] ZHU J,LI C H,LIU K,et al.Electrical properties of TiN/AlN composite ceramic[J].Semiconductor Technology,2014,39(3):204-209. [3] GE C C,LIU W S,XIA Y L,et al.Oxidation behaviour of Si3N4-ZrN-AlN ceramics[J].Key Engineering Materials,1993,89-91:307-312. [4] 曾照强,陈英杰,吴崇隽,等.反应热压法制备TiB2/AlN复合陶瓷[J].金属学报,1999,35(6):659-662. [5] 朱江,李晨辉,刘凯,等.TiN/AlN复合陶瓷的电性能[J].半导体技术,2014,39(3):204-209. [6] 王森,梁峰,田亮,等.氮化铝晶须制备研究进展[J].耐火材料,2019,53(2):154-160. [7] 郭坚,丘泰,杨建.AlN粉末抗水解处理的研究进展[J].电子元件与材料,2009,28(11):80-84. [8] 聂光临,盛鹏飞,黎业华,等.AlN粉体表面抗水解涂层的制备及其对AlN陶瓷热导率的影响[J].稀有金属材料与工程,2021,50(6):1904-1909. [9] 尹少武,王立,刘传平,等.硅粉常压直接氮化制备氮化硅粉的研究[J].硅酸盐通报,2008,27(2):230-235. [10] CHEN F Y,LUO F X,ZHOU Z H,et al.Effects of silicon particle size on the morphology of rod-like Si3N4 crystals prepared by SHS method[J].Key Engineering Materials,2016,680:103-106. [11] 万小涵,张广清,SHARP J,等.高氮分压对碳热还原/氮化法合成氮化硅的影响[J].有色金属工程,2015,5(4):9-12. [12] SUN S Y,WANG Q,GE Y Y, et al.Synthesis and growth mechanism of approximate spherical β-Si3N4 particles via carbothermal reduction-nitridation method[J].Journal of the American Ceramic Society,2017,100(12):5779-5786. [13] 田亮,梁峰,张杰峰,等.熔盐氮化法低温合成AlN粉体[J].陶瓷学报,2017,38(3):352-355. [14] WANG S,LIANG F,LI S S, et al.Synthesis of monophase two-dimensional α-Si3N4 nanoplatelets via an ionothermal route[J].International Journal of Applied Ceramic Technology,2021,18(4):1183-1191. [15] LIU X Z,GUO R,ZHANG S J,et al.Formation of different Si3N4 nanostructures by salt-assisted nitridation[J].ACS Applied Materials & Interfaces,2018,10(14):11852-11861. [16] SHAHIEN M,YAMADA M ,YASUI T,et al.In situ fabrication of AlN coating by reactive plasma spraying of Al/AlN powder[J].Coatings,2011,1(2):88-107.
|