耐火材料 ›› 2022, Vol. 56 ›› Issue (4): 312-314.DOI: 10.3969/j.issn.1001-1935.2022.04.008

• 研究开发 • 上一篇    下一篇

水蒸气压力对两种SiC质耐火材料氧化速度的影响

罗天, 王文武, 牛世程, 郭文辉   

  1. 中钢集团洛阳耐火材料研究院有限公司 先进耐火材料国家重点实验室 河南洛阳 471039
  • 收稿日期:2021-11-08 出版日期:2022-08-15 发布日期:2022-11-09
  • 作者简介:罗天:男,1996年生,硕士研究生。E-mail:651274008@qq.com
  • 基金资助:
    郑洛新国家自主创新示范区创新引领性产业集群专项资助(201200211500)。

Effect of water vapor pressure on oxidation rate of two types of SiC refractories

Luo Tian, Wang Wenwu, Niu Shicheng, Guo Wenhui   

  1. State Key Laboratory of Advanced Refractories,Sinosteel Luoyang Institute of Refractories Research Co.,Ltd.,Luoyang 471039,Henan,China
  • Received:2021-11-08 Online:2022-08-15 Published:2022-11-09

摘要: 为改进SiC质耐火材料的抗氧化性测试方法,节省测试时间,研究了Si3N4-SiC、Si2N2O/Si3N4-SiC两种SiC质耐火材料在1 000 ℃不同水蒸气压力(分别为0.10、0.11、0.13、0.15、0.17、0.19 MPa)下氧化不同时间(分别为20和40 h)后的氧化量,检测了氧化前后试样的质量和显气孔率,通过数理统计方法分析了质量变化率与水蒸气压力的数学关系。结果表明:Si3N4-SiC和Si2N2O/Si3N4-SiC质耐火材料在1 000 ℃水蒸气中的氧化速度随水蒸气压力的提高而增大;在氧化20和40 h后,其质量变化率的二次方与水蒸气压力具有高度显著的线性关系,表明它们的氧化基本遵循经典的抛物线动力学方程。

关键词: SiC, 氧化, 水蒸气, 压力

Abstract: In order to improve the oxidation resistance test method for SiC refractories and to save testing time,the oxidation of two kinds of SiC refractories (Si3N4-SiC and Si2N2O/Si3N4-SiC) treated by 1 000 ℃ water vapor with different pressures (0.10,0.11,0.13,0.15,0.17,and 0.19 MPa,respectively) for different periods (20 and 40 h,respectively) was studied.The mass and the apparent porosity of the specimens before and after oxidation were measured,and the mathematical relationship between the mass change rate and the water vapor pressure was analyzed by the mathematical statistics method.The result indicates that the increase of the water vapor pressure accelerates the oxidation progress of Si3N4-SiC and Si2N2O/Si3N4-SiC refractories at 1 000 ℃;the square of the mass change rate has a highly significant linear relationship with the water vapor pressure after being oxidized for 20 or 40 h,which shows that the oxidation basically follows the classical parabolic kinetic equations.

Key words: silicon carbide, oxidation, water vapor, pressure

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